Extending molecular lines on the Si(100)-2 × 1 surface: A theoretical study of the effect of allylic mercaptan adsorbates on radical chain reactions

Glen A. Ferguson, Christopher Trong Linh Than, Krishnan Raghavachari

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

The reaction mechanism for the adsorption and growth of allylic mercaptan (ALM) at a defect site on the Si(100)-2 × 1 surface has recently been proposed. The adsorbate structure is believed to be a branched or linear ALM molecule forming a bridge across silicon dimer rows on the Si(100)-2 ×1 surface. Subsequent reactions at the radical site formed by an ALM adsorbate have not been studied previously. We have now calculated the reactivity of ALM, acetone, and styrene at radical sites formed by an ALM adsorbate. The reactivity of ALM and acetone is unaffected by adjacent ALM adsorbates. The same is true for styrene reacting adjacent to a linear ALM adsorbate. A branched adsorbate significantly destabilizes a styrene adsorbate, making styrene more likely to desorb than to react further. The origin of this destabilization is the partially broken silicon dimer bond. These results are consistent with available experimental observations and support the proposal of a branched ALM adsorbate bridging dimer rows.

Original languageEnglish (US)
Pages (from-to)679-685
Number of pages7
JournalJournal of Physical Chemistry Letters
Volume1
Issue number4
DOIs
StatePublished - Feb 18 2010
Externally publishedYes

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Adsorbates
Sulfhydryl Compounds
thiols
Styrene
styrenes
Dimers
dimers
Acetone
Silicon
acetone
reactivity
destabilization
silicon
proposals
Adsorption
Defects
Molecules
adsorption
defects

Keywords

  • Catalysis
  • Interfaces
  • Surfaces

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Extending molecular lines on the Si(100)-2 × 1 surface : A theoretical study of the effect of allylic mercaptan adsorbates on radical chain reactions. / Ferguson, Glen A.; Than, Christopher Trong Linh; Raghavachari, Krishnan.

In: Journal of Physical Chemistry Letters, Vol. 1, No. 4, 18.02.2010, p. 679-685.

Research output: Contribution to journalArticle

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N2 - The reaction mechanism for the adsorption and growth of allylic mercaptan (ALM) at a defect site on the Si(100)-2 × 1 surface has recently been proposed. The adsorbate structure is believed to be a branched or linear ALM molecule forming a bridge across silicon dimer rows on the Si(100)-2 ×1 surface. Subsequent reactions at the radical site formed by an ALM adsorbate have not been studied previously. We have now calculated the reactivity of ALM, acetone, and styrene at radical sites formed by an ALM adsorbate. The reactivity of ALM and acetone is unaffected by adjacent ALM adsorbates. The same is true for styrene reacting adjacent to a linear ALM adsorbate. A branched adsorbate significantly destabilizes a styrene adsorbate, making styrene more likely to desorb than to react further. The origin of this destabilization is the partially broken silicon dimer bond. These results are consistent with available experimental observations and support the proposal of a branched ALM adsorbate bridging dimer rows.

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