Electronic structure of the YD tyrosyl radical in photosystem II: A high-frequency electron paramagnetic resonance spectroscopic and density functional theoretical study

Christian T. Farrar, Gary J. Gerfen, Robert G. Griffin, Dee Ann Force, R. David Britt

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We report the high-frequency (139.5 GHz) electron paramagnetic resonance (EPR) spectrum of the Y.D tyrosyl radical of photosystem II. A rhombic powder pattern with principal g values g1 = 2.007 82, g2 = 2.004 50, and g3 = 2.002 32 is observed. The well-defined turning points and the value of the largest principal g value are indicative of ordered hydrogen bonding to the tyrosyl phenyl oxygen. Hyperfine structure is resolved on all three turning points. Proton hyperfine couplings obtained from the simulation of the 139.5 GHz EPR spectrum are in good agreement with X-band electron spin echo-electron nuclear double resonance studies. The high-frequency EPR spectrum was acquired under conditions of saturation in which the dispersion signal is detected. Proper replication of the high-frequency EPR spectral features is only achieved in simulations which account for the line shapes characteristic of saturated dispersion signals. Comparison of the Y.D spectrum with spectra of non-hydrogen bonded tyrosyl radicals indicates that the largest principal g value (g1), oriented along the C-O bond, is sensitive to hydrogen bonding at the phenyl oxygen. Density functional calculations indicate that the decreased downfield shift in g1 from the free electron g value with increasing hydrogen bond strength arises from both a decreased spin density on the phenyl oxygen-5-30% over a range of reasonable hydrogen bond distances (2.0-1.1 Å) - and an increased splitting between ground state and excited state singly occupied molecular orbitals.

Original languageEnglish (US)
Pages (from-to)6634-6641
Number of pages8
JournalJournal of Physical Chemistry B
Issue number33
Publication statusPublished - Aug 14 1997


ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films
  • Materials Chemistry

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