Iron Oxide-An Inorganic Photoresist and Mask Material

Engineering & Materials Science

• Iron oxides 100%
• Photoresists 97%
• Masks 72%
• Solubility 63%
• Laser beam effects 28%
• Sputtering 24%
• Oxide films 23%
• Chemical vapor deposition 22%
• Laser beams 21%
• Argon 21%
• Etching 20%
• Evaporation 19%
• Thin films 18%
• Integrated circuits 17%
• Ions 17%
• Acids 17%
• Lasers 14%
• Temperature 7%

Physics & Astronomy

• iron oxides 83%
• photoresists 81%
• masks 65%
• solubility 52%
• irradiation 24%
• translating 24%
• integrated circuits 18%
• acids 17%
• lasers 16%
• sputtering 15%
• argon 14%
• vapor deposition 14%
• evaporation 14%
• etching 14%
• laser beams 13%
• thin films 9%
• ions 8%

Chemical Compounds

• Liquid Film 37%
• Solubility 36%
• Iron Oxide 36%
• Deposition Technique 20%
• Sputtering 20%
• Etching 17%
• Chemical Vapour Deposition 17%
• Evaporation 17%
• Velocity 16%
• Mixture 8%
• Time 6%
• Acid 6%